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Scope This multidisciplinary conference deals with everything from catalytic decomposition, via gas phase chemistry, to thin film materials and devices. It addressed chemical deposition chemistry (including catalytic filament issues), chemical and electronic passivation techniques, thin films that can be obtained consisting of silicon (possessing various nanostructures, epitaxial films), dielectric materials, as well as carbon-related films (polymers, diamond-like films, nanotubes). In addition, the conference placed emphasis on promoting industrial implementation and commercialization of this rapidly maturing technology by demonstrating large area and economically interesting capabilities of the Hot Wire CVD technology. Introduction to the conference. |
The first conference was held in Kanazawa, Japan, November 2000. The second conference was held in Denver, USA, September 2002. The fourth conference in Takayama, Japan, October 2006. The proceedings were published in Thin Solid Films, Vol. 395 (Sept. 2001), Vol. 430 (May 2003), Vol. 501 (2006) and Vol.516 (2008) respectively. The next conference will take place at MIT in Cambridge, MA, USA, from August 20 - 24, 2008. Follow this link to the website. Last updated: 13-05-2008 |
